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魅麗。花火原創小說66折起
Amorphous and Crystalline Insulating Thin Films ― 1996:VOLUME446
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Amorphous and Crystalline Insulating Thin Films ― 1996:VOLUME446

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The December 1996 proceeding papers following the continuing research and development of thin dielectric films for optical and microelectronic applications. The 85 papers cover technical sessions dealing with thin SiO2-based dielectrics, silicon oxynitride, low-dielectric constant and organic dielectrics, high-dielectric constant materials, SiO2 growth and properties, and silicon-on-insulator materials. The discussions on ultra-thin oxides deal with topics ranging from the effects of the enhanced performance of deuterated oxides, the fabrication of hydrogen-free oxides and the effects of differing gate electrodes, to the effects of post-metallization annealing of these dielectrics. Annotation c. by Book News, Inc., Portland, Or.

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優惠價:90 1499
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