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Chemical Processing of Dielectrics, Insulators and Electronic Ceramics：VOLUME606
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Contains 44 papers from the November/December 1999 symposium which focused on the chemical fabrication of oxide and non-oxide materials that are likely to play a role in the development of the next generation of microelectronics devices. The hot areas of research are reflected in the discussion of the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and new precursors of III-V nitrides. The emphasis throughout the volume is on chemical methods for the controlled deposition of thin films, especially chemical vapor deposition (CVD). Solution deposition techniques such as sol-gel, metalorganic decomposition, hydrothermal processing, and chemical bath techniques are also featured. Annotation c. Book News, Inc., Portland, OR (booknews.com)
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