商品簡介
Proceedings of the title symposium, held during the 1993 Fall Meeting of the MRS in Boston. The invited and contributed papers address the current state of the art in vapor-phase thin film processing for microelectronics with emphasis on chemistry and its effects on film quality. The volume is divided into six sections: silicon and carbon systems; compound semiconductors; metallization; dielectrics and transitional layers; etching; and special topics deposition on patterned substrates, reactor design, heteroepitaxy, selective epitaxy. Annotation copyright Book News, Inc. Portland, Or.
