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2016年以前 (4)
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Edited by J. Joseph Clement 、William F. Filter 、Patrick M. Lenahan 、Anthony S. Oates 、Robert Rosenberg (1)
Edited by Kenneth P. Rodbell 、William F. Filter 、Harold J. Frost 、Paul S. Ho (1)
Edited by Peter Børgesen 、John C. Coburn 、William F. Filter 、John E. Sanchez、Jr. 、Kenneth P. Rodbell (1)
Edited by William F. Filter 、Kamesh Gadepally 、A. Lindsay Greer 、Anthony S. Oates 、Robert Rosenberg (1)
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CAMBRIDGE UNIVERSITY PRESS (4)

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Materials Reliability in Microelectronics III:VOLUME309
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作者:Edited by Kenneth P. Rodbell ; William F. Filter ; Harold J. Frost ; Paul S. Ho  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:1993/08/31 裝訂:平裝
The proceedings of the title symposium, held in San Francisco in April 1993, comprise invited and contributed papers in the areas of dielectric reliability; microstructure effects on reliability; stre
定價:1665 元, 優惠價:9 1499
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Materials Reliability in Microelectronics V:VOLUME391
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Mirroring the topical content of the April 1995 symposium (held at the MRS Spring Meeting), this volume contains invited and contributed papers in the areas of modeling and simulation of failure mecha
定價:1665 元, 優惠價:9 1499
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Materials Reliability in Microelectronics VI:VOLUME428
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The annual snapshot of the subject presents 78 papers covering a historical summary of the past 30 years, copper metallization, the characterization of electromigration phenomena, modeling, microstruc
定價:1665 元, 優惠價:9 1499
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Materials Reliability in Microelectronics IV:VOLUME338
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Proceedings from the Materials Research Society symposium held in San Francisco, April 1994. Invited and contributed papers cover oxides, thin films, experimental techniques, stress in semiconductors
定價:1665 元, 優惠價:9 1499
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