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Oxide Reliability

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出版日:2002/04/01 作者:D. J. Dumin (EDT)  出版社:World Scientific Pub Co Inc  裝訂:精裝
Industry experts provide an overview of the mature topic of oxide reliability, which concerns bias-temperature stability, uniformity, interface properties, leakage currents, endurance, and the use of
若需訂購本書,請電洽客服 02-25006600[分機130、131]。
出版日:2017/06/06 作者:Nigel Brandon  出版社:Academic Pr  裝訂:平裝
Solid Oxide Fuel Cell Lifetime and Reliability: Critical Challenges in Fuel Cells presents in one volume the most recent research that aims at solving key issues for the deployment of SOFC at a commer
若需訂購本書,請電洽客服 02-25006600[分機130、131]。
Materials Reliability in Microelectronics II:VOLUME265
90 折
出版日:1992/09/30 作者:Edited by C. V. Thompson ; J. R. Lloyd  出版社:CAMBRIDGE UNIVERSITY PRESS  裝訂:平裝
Proceedings of the San Francisco, Calif. symposium of April-May 1992, on stress and electromigration/modelling, microstructure, metallization for interconnects ..., oxide and device reliability, analy
優惠價: 9 1499
無庫存
Materials Reliability Issues in Microelectronics:VOLUME225
90 折
出版日:1991/10/22 作者:James R. Lloyd  出版社:Materials Research Society  裝訂:精裝
With the increased complexity of modern integrated circuits, it is important that reliability problems be attacked properly with the appropriate tools. This volume recognizes that almost all reliability problems are materials problems, and helps to put 'reliabilty physics' on a firm scientific foundation. Topics include: electromigration; stress effects on reliability; stress and packaging; metallization; device, oxide and dielectric reliability; new investigative techniques; corrosion.
優惠價: 9 1696
無庫存
HF-BASED HIGH-K DIELECTRICS: PROCESS DEVELOP
95 折
出版日:2005/01/01 作者:YOUNG-HEE KIM  出版社:IG  裝訂:精裝
In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru–Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull
優惠價: 95 1442
無庫存
Science and Technology of Semiconductor Surface Preparation:VOLUME477
90 折
出版日:1997/09/30 作者:Edited by G. S. Hagashi ; M. Hirose ; S. Ragahavan ; S. Verhaverbeke  出版社:CAMBRIDGE UNIVERSITY PRESS  裝訂:平裝
Contains papers from an April 1997 symposium, in sections on megasonic cleaning, SC1 technology, surface preparation and gate oxide reliability, CMP/CMP cleaning, post-etch processing, surface microro
優惠價: 9 1499
無庫存
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