商品簡介
These proceedings from the April 1998 symposium illustrate how the range of rapid thermal processing (RTP) applications in silicon device manufacturing is expanding and how mature the technology has become. The 51 contributions are grouped under six headings--RTP equipment modeling and new concepts, temperature measurement and control in RTP equipment, MOSGET gate stack engineering, MOSFET channel and source/drain engineering, silicides, and new applications for rapid thermal processing. Annotation c. by Book News, Inc., Portland, Or.
