TOP
紅利積點抵現金,消費購書更貼心
Principles Of Plasma Discharges And Materials Processing, Second Edition
滿額折

Principles Of Plasma Discharges And Materials Processing, Second Edition

商品資訊

定價
:NT$ 7864 元
優惠價
907078
若需訂購本書,請電洽客服 02-25006600[分機130、131]。
商品簡介
作者簡介
目次

商品簡介

A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:
* Updated cross sections
* Diffusion and diffusion solutions
* Generalized Bohm criteria
* Expanded treatment of dc sheaths
* Langmuir probes in time-varying fields
* Electronegative discharges
* Pulsed power discharges
* Dual frequency discharges
* High-density rf sheaths and ion energy distributions
* Hysteresis and instabilities
* Helicon discharges
* Hollow cathode discharges
* Ionized physical vapor deposition
* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

作者簡介

MICHAEL A. LIEBERMAN, PhD, is Professor in the Graduate School in Electrical Engineering at the University of California, Berkeley. He has published more than 170 journal articles on the topics of plasmas, plasma processing, and nonlinear dynamics. He has also coauthored, with Professor Lichtenberg, Regular and Stochastic Motion and Regular and Chaotic Dynamics, Second Edition.

ALLAN J. LICHTENBERG, PhD, is Professor in the Graduate School in Electrical Engineering at the University of California, Berkeley. A respected pioneer in the fields of high-temperature plasmas, plasma discharges, and nonlinear dynamics, he has published about 150 articles in these areas. In addition to the books coauthored with Professor Lieberman, he has written an earlier monograph Phase-Space Dynamics of Particles (Wiley).

目次

1. Introduction.

2. Basic Plasma Equations and Equilibrium.

3. Atomic Collisions.

4. Plasma Dynamics.

5. Diffusion and Transport.

6. DC Sheaths.

7. Chemical Reactions and Equilibrium.

8. Molecular Collisions.

9. Chemical Kinetics and Surface Processes.

10. Particle and Energy Balance in Discharges.

11. Capacitive Discharges.

12. Inductive Discharges.

13. Wave-Heated Discharges.

14. DC Discharges.

15. Etching.

16. Deposition and Implantation.

17. Dusty Plasmas.

18. Kinetic Theory of Discharges.

Appendix A: Collision Dynamics.

Appendix B: The Collision Integral.

Appendix C: Diffusion Solutions for Variable Mobility Model.

購物須知

外文書商品之書封,為出版社提供之樣本。實際出貨商品,以出版社所提供之現有版本為主。部份書籍,因出版社供應狀況特殊,匯率將依實際狀況做調整。

無庫存之商品,在您完成訂單程序之後,將以空運的方式為你下單調貨。為了縮短等待的時間,建議您將外文書與其他商品分開下單,以獲得最快的取貨速度,平均調貨時間為1~2個月。

為了保護您的權益,「三民網路書店」提供會員七日商品鑑賞期(收到商品為起始日)。

若要辦理退貨,請在商品鑑賞期內寄回,且商品必須是全新狀態與完整包裝(商品、附件、發票、隨貨贈品等)否則恕不接受退貨。

優惠價:90 7078
若需訂購本書,請電洽客服 02-25006600[分機130、131]。

暢銷榜

客服中心

收藏

會員專區