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805筆商品,8/41頁
Applications of Synchrotron Radiation Techniques to Materials Science IV:VOLUME678
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作者:Edited by P. G. Allen ; S. M. Mini ; D. L. Perry ; S. R. Stock  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2001/11/13 裝訂:平裝
A collection of 26 papers, originally presented at the April 2001 symposium, devoted to the materials science community's concern with the characterization techniques that use synchrotron radiation (S
定價:1665 元, 優惠價:9 1499
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GaN and Related Alloys – 2001:VOLUME693
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The November 2001 continuation of the MRS symposium series concentrated on significant advances in basic science regarding nitride compound semiconductors such as GaN (gallium nitride) and related all
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Thin Films: Stresses and Mechanical Properties IX:VOLUME695
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作者:Edited by Cengiz S. Ozkan ; L. Ben Freund ; Robert C. Cammarata ; Huajian Gao  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/04/01 裝訂:平裝
Covering strain relaxation and strengthening mechanisms, defects formation, mechanical properties and nanoscale testing, adhesion and fracture, thin film applications, computation modeling and experim
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Current Issues in Heteropitaxial Growth – Stress Relaxation and Self Assembly:VOLUME696
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作者:Edited by Eric A. Stach ; Eric H. Chason ; Robert Hull ; Samuel D. Bader  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/06/27 裝訂:平裝
This collection of 45 papers from a November 2001 symposium presents recent research on the growth of heteroepitaxial structures for semiconductors and superconductors. The contributors explore the e
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Surface Engineering 2001 – Fundamentals and Applications:VOLUME697
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作者:Edited by Wen Jin Meng ; Ashok Kumar ; Gary L. Doll ; Yang-Tse Cheng ; Stan Veprek ; Yip-Wah Chung  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/08/27 裝訂:平裝
This proceedings from the November 2001 symposium consists of 63 papers on nanostructured ceramic thin films, fundamental and applied tribology, surface modification of microscale structures and devic
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Electroactive Polymers and Rapid Prototyping:VOLUME698
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Contains the contents of two symposia, both held in November 2001: the first part of the volume presents Symposium EE, "Electroactive Polymers and Their Applications as Actuators, Sensors, and Artific
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Electrically Based Microstructural Characterization III:VOLUME699
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作者:Edited by Rosario A. Gerhardt ; Andrew P. Washabaugh ; M. A. Alim ; Gyeong Man Choi  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/09/05 裝訂:平裝
Among the topics of invited papers are the electrical characterization of inhomogeneous and heterogeneous systems with microstructural periodicity, impedance spectroscopy in ferromagnetic materials, t
定價:1665 元, 優惠價:9 1499
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Amorphous and Heterogeneous Silicon-Based Films – 2002:VOLUME715
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作者:Edited by J. David Cohen ; John R. Abelson ; Hideki Matsumura ; John Robertson  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/10/11 裝訂:平裝
The latest gathering of the symposium continued the tradition of an international and young presence. The 114 papers cover the fundamentals of amorphous and microcrystalline film growth, hot-wire CVD
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Silicon Materials–Processing, Characterization and Reliability:VOLUME716
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作者:Edited by Janice L. Veteran ; David L. O'Meara ; Veena Misra ; Paul S. Ho  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/10/11 裝訂:平裝
Representing Symposium B at the April 2002 MRS Spring meeting, some 100 papers (roughly half of the total presented) address all facets of silicon processing except for junction formation, which was c
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Defect and Impurity Engineered Semiconductors and Devices III:VOLUME719
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作者:Edited by S. Ashok ; J. Chevallier ; N. M. Johnsonn ; B. L. Sopori ; H. Okushi  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/08/09 裝訂:平裝
Seventy-one papers from the April 2002 symposium explore the deliberate introduction and manipulation of defects and impurities for finding desired properties in semiconductor materials and devices. T
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Materials Issues for Tunable RF and Microwave Devices III:VOLUME720
滿額折
作者:Edited by Steven C. Tidrow ; James S. Horwitz ; Xiaoxing Xi ; Jeremy Levy  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2002/08/09 裝訂:平裝
Challenges facing the implementation of an affordable tunable RF and microwave device technology are discussed in these papers from an April 2002 meeting. Materials issues and devices are examined, wi
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Magnetic and Electronic Films – Microstructure, Texture and Application to Data Storage:VOLUME721
滿額折
Papers from an April 2002 meeting present recent work on texture and microstructure in electronic and magnetic films, and on nanostructural magnetic materials for data storage, examining areas such as
定價:1665 元, 優惠價:9 1499
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Organic and Polymeric Materials and Devices – Optical, Electrical and Optoelectronic Properties:VOLUME725
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Applications and basic science are both represented by the 41 selected papers. They cover the synthesis, devices, interfaces, and charge transport of organic light-emitting materials; material and dev
定價:1665 元, 優惠價:9 1499
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Spatially Resolved Characterization of Local Phenomena in Materials and Nanostructures:VOLUME738
滿額折
作者:Edited by Javier Piqueras ; Fredy R. Zypman ; Dawn A. Bonnell ; Andrew P. Shreve  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/03/27 裝訂:平裝
Containing more than 60 contributions from international scientists, this volume discusses recent advances in the ability to measure the structure and properties of various materials at spatially loca
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Three-Dimensional Nanoengineered Assemblies:VOLUME739
滿額折
作者:Edited by K. Ikuta ; L. Merhari ; T. M. Orlando ; D. P. Taylor  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/06/13 裝訂:平裝
This 2003 book is a compilation of papers which address fundamental studies, technological advances and novel approaches to developing and processing three-dimensional nanoscale assemblies. Topics inc
定價:1575 元, 優惠價:9 1418
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Nano and Microelectromechanical Systems (NEMS and MEMS) and Molecular Machines:VOLUME741
滿額折
作者:Edited by David A. LaVan ; Arturo A. Ayón ; Thomas E. Buchheit ; Marc J. Madou  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/05/27 裝訂:平裝
Devoted to the investigation of materials behavior and device issues at the micro-, nano-, and molecular level as well as the behavior and interface between micro-, nano-, and molecular devices, this
定價:1665 元, 優惠價:9 1499
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Silicon Carbide 2002 ― Materials, Processing and Devices:VOLUME742
滿額折
作者:Edited by Stephen E. Saddow ; David J. Larkin ; Nelson S. Saks ; Adolf Schoener  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/03/25 裝訂:平裝
This work assembles papers presented at a December 2002 symposium, representing the latest activities in silicon carbide (SiC) research and development. Themes are epitaxial growth, characterization a
定價:1665 元, 優惠價:9 1499
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GaN and Related Alloys ― 2002:VOLUME743
滿額折
作者:Edited by Christian Wetzel ; Edward T. Yu ; James S. Speck ; Angela Rizzi ; Yasuhiko Arakawa  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/06/02 裝訂:平裝
Papers from a December 2002 symposium reflect recent nitride-related advances, from basic material physics to high performance devices. Areas discussed include devices and defect reduction, defects an
定價:1665 元, 優惠價:9 1499
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Defect Properties and Related Phenomena in Intermetallic Alloys:VOLUME753
滿額折
作者:Edited by Easo P. George ; Haruyuki Inui ; Michael J. Mills ; Gunther Eggeler  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/06/25 裝訂:平裝
The symposium continued the general tradition established by its predecessors in the series High-Temperature Ordered Intermetallic Alloys, held every other year since 1984. It also diverged, however,
定價:1665 元, 優惠價:9 1499
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Supercooled Liquids, Glass Transition and Bulk Metallic Glasses:VOLUME754
滿額折
作者:Edited by T. Egami ; A. L. Greer ; A. Inoue ; S. Ranganathan  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2003/07/16 裝訂:平裝
Papers from a December 2002 symposium reflect the range of recent advances in the field, from fundamental studies of atomic-level topological criteria for glass formation through practical details of
定價:1665 元, 優惠價:9 1499
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