Chemical Solution Deposition of Functional Oxide Thin Films

In spite of the substantial progress, no comprehensive book on this topic has, until now, been available. Moreover, the potential for the fabrication of device quality films by CSD methods is often not known to potential industrial users. This is the first book which comprises all aspects of CSD of functional oxide thin films. Chemical Solution Deposition (CSD) has emerged as a highly flexible and inexpensive technique for the fabrication of functional oxide thin films. While the development of sol-gel type processes for optical coatings of glass by silicon dioxide and titanium dioxide dates from the mid 20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared only as recently as the 1980's. Since the initial studies, a wide variety of perovskite-related and other compounds on various types of substrates have been prepared as thin films by CSD techniques. In the appendix detailed "cooking recipes" for prominent material systems will be presented.