商品簡介
Contains papers from an April 1997 symposium. Papers are organized in sections on measurement, RTCVD, modeling and manufacturing, integrated processing, silicides, annealing and defects, dielectrics, and RTP of III-V materials and other novel applications. Themes include temperature calibration and metrology, processing of strained Si/Ge layers, evaluation and modeling of furnaces, integrated cleaning of gate stack cluster tools, interaction between the implant and anneal processes, and developments in processing of dielectrics. Annotation c. by Book News, Inc., Portland, Or.
