商品簡介
Documents the April 1999 international symposium in San Francisco, California. The 83 papers cover advances and ultrathin oxides and oxynitrides, alternative processes for growing silicon oxide using silicon nitride silicon oxynitrides and nitride, the atomic-scale control of the interface between the dielectric and the silicon, electric properties of ultrathin gate dielectrics, their reliability, high-K gate dielectrics and alternative processes for them, characterizing gate dielectrics, and integrated processing. Annotation c. Book News, Inc., Portland, OR (booknews.com)
