Handbook Of Chemicals And Gases For The Semiconductor Industry

The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. Until now, there has been no convenient source of information on the properties, applications, and health and safety considerations of the chemicals used in these processes. The Handbook of Chemicals and Gases for the Semiconductor Industry meets this need. Each of the Handbook's eight chapters is related to a specific area of semiconductor processing. The authors provide a brief overview of each step in the process, followed by tables containing physical properties, handling, safety, and other pertinent information on chemicals and gases typically used in these processes. The 270 chemical and gas entries include data on physical properties, emergency treatment procedures, waste disposal, and incompatible materials, as well as descriptions of applications, chemical mechanisms involved, and references to the literature. Appendices cross-reference entries by process, chemical name, and CAS number. The Handbook's eight chapters are:Thin Film Deposition Materials Wafer Cleaning Materials Photolithography Materials Wet and Dry Etching Materials Chemical Mechanical Planarizing Methods Carrier Gases Uncategorized Materials Semiconductor Chemicals Analysis No other single source brings together these useful and important data on chemicals and gases used in the manufacture of semiconductor devices. The Handbook of Chemicals and Gases for the Semiconductor Industry will be a valuable reference for process engineers, scientists, suppliers to the semiconductor industry, microelectronics researchers, and students.

ASHUTOSH MISRA is Director of Applications and New Product Development for Air Liquide Electronics, Inc.
JEREMIAH D. HOGAN is Director of Physical Analysis Laboratories for Texas Instruments, Inc.
RUSSELL A. CHORUSH is an associate at the law firm of Conley, Rose and Tayon, PC

Thin Film Deposition Materials.

Wafer Cleaning Chemicals.

Photolithography Materials.

Wet and Dry Etching Materials.

Chemical Mechanical Planarizing Materials.

Carrier Gases.

Uncategorized Materials.

Semiconductor Chemicals Analysis.

Index.